ULVAC's DC power supplies are used in DC sputtering of Al, Ni, and other materials. In combination with an A2K abnormal discharge prevention unit, the DC power supplies are also effective in the reactive sputtering of SiNx, DLC, etc. Evaporation source (Electron Beam gun) uses magnetic field deflection, and has a structure to help prevent contamination on a filament from the evaporation materials.
As the basic performance is a matter of course, DCS series provides superior cost performance and is used in various applications. Combination use of the arc suppression unit, A2K, is effective well in reactive sputtering.
ULVAC new DCL Series are DC power supplies for sputtering that come with the world's highest level of arc energy reduction as a standard function. This function enables them to minimize the energy emitted by abnormal discharges. The series is low-priced, and comes with other outstanding functions, including a high-speed control function, a wide range of output control functions, and communication functions.
ULVAC EB guns for electron beam evaporation all use magnetic field deflection,and are structured to minimize contamination from the evaporated material. A wide lineup of models is available. The EGK Series is designed for low-capacity research applications,the EGL Series is for metal film production,and the EGO Series is for optical film production.
The HPS series are power supplies for electron beam evaporation. They can be used together with the EGL Series or other electron guns, for stable evaporation.
