ULVAC VACUUM > Thin Film Measurement > Non-contact Type > UNECS-2000 Compact High-speed Spectroscopic Ellipsometer

UNECS-2000 Compact High-speed Spectroscopic Ellipsometer

ULVAC, Inc.

Adobe Acrobat Reader (Ver.6 or a later version)is required to open PDF files.

UNECS-2000 is based on the Spectroscopic ellipsometry by utilizing the high-order retarders. It is the newest spectroscopic ellipsometer, which realized the high-speed and has a compact size. It has an excellent cost performance, which was impossible by the conventional spectroscopic ellipsometer. Its motorized stage can measure the sample up to the size of φ200mm . Users can use it very easily to get high accurate measurement results. It can be used for various applications such as R&D purposes and manufacturing lines etc.

Features

• The high-order retarders are utilized to generate the spectrum carrying information about the wavelength-dependent multiple parameters of polarization of light. It requires no mechanical or active components for polarization-control, such as a rotating compensator and electro-optic modulator. Its snapshot method makes the high- speed measurement possible.

• The sizes of emitter and receiver of sensor unit are very small due to the spectroscopic ellipsometry by utilizing high-order retarders. The built-in light source and controller are mounted into the modern designed compact enclosure.

• Other than the main measurement unit with a φ200mm motorized stage, a laptop PC with data analysis software is configured as a default. Users can enjoy the excellent cost performance advantage of this new spectroscopic ellipsometer.

• Users can easily to edit and add material table files by themselves.

• It’s possible to measure the multi-layer film thickness up to 6 layers.

Applications

• Transparent or semitransparent films on the substrates up to φ200mm (Oxide film, nitride film, photo resist film, ITO etc.)

Specifications

Measurment method		Spectroscopic ellipsometry
Film for measurement ^*1		Transparent film and semitransparent film
Light source		Halogen lamp
Spot size		φ1mm (On substrate： 1[mm] × 3[mm] )
Wavelength		530 to 750 [nm]
Multi-layer film measurement		Film thickness : Max 6 layer Film thickness and optical parameter : 1layer (Only the top layer)
Angle of incidence		70º fixed
Film thickness Repeatability ^{2 3 *4}		0.1 [nm]
Film thickness measurement range ^*3		1[nm] to 2 [μm]
Sampling time ^*3		20ms to 3000ms (setting is possible)
Analysis time^*2		300ms
Material data file ^*5		Si, SiO₂, Si₃N₄, a-Si, BK7 Ta, Cu, Au, Ni, W, etc.
Sample stage size		φ210 [mm]
Maximum sample size		φ200 [mm]
Stage	R	0 to 100 [mm] Motor-driven
	θ	0 to 359 [ º ] Motor-driven
	Z	0 to 10 [mm] manual
Control PC		Laptop PC
Dimentions		500(Ｗ)×512(Ｄ)×428(Ｈ) [mm] PC is excluded
Weight		40 [kg] PC is excluded

*1	The thickness measurement range for semitransparent films is different than that of transparent films.
*2	When only the film thickness value is assumed to be a fitting parameter, and the SiO₂ film (about 100 nm) on the Si substrate is measured.
*3	When SiO₂ single-layer film on Si wafer is measured.
*4	Standard deviation (1σ) when measuring it continuousness ten times.
*5	Material files can be added by the user.