ULVAC VACUUM > Gas analyzers > Gas analyzers > REPROS Process Monitors for Reaction Gas
REPROS Process Monitors for Reaction Gas
The REPROS systems are process monitors used with reactive processes such as etching and CVD. They supply and analyze process chamber gas using a mass filter gas analyzer and differential evacuation system. REPROS models have outstanding corrosion resistance, and enable stable measurements over extended periods. Their ion sources have low thermal reactivity and molecular breakdown, enabling accurate monitoring of process reactions.
- Stable measurements in reactive processes for extended periods
Original high-sensitivity closed ion source prevents breakdown due to ionization, and breakdown and adsorption due to thermal reaction.
Compact duct control valve minimizes the distance to the process chamber, enabling quick-response analysis.
Measurement under wide range of pressures (10-6 to 13kPa)
Compact and lightweight design makes attachment to process chamber easy.
- Monitoring reaction gases in processes
End point monitoring of etching and cleaning processes
Residual gas measurement
Leak Tests
| Model | RE-201P | RE-202P | RE-402P |
| Measured atomic mass number range (amu) | 2 to 200 | 2 to 400 | |
| Resolution | M/ΔM=1M(10%P.H.) | ||
| Sensitivity Direct supply (A/Pa) Orifice supply |
1 x 10-7 1 x 10-6 |
1 x 10-3 1 x 10-2 |
|
| Minimum detection partial pressure (Pa) | 5 x 10-8 | 1 x 10-10 | |
| Ion source | Closed ion source with magnet | ||
| Filament | V-shaped Ir/Y2O3 (x 1) | ||
| Ionization voltage (eV) | 20 to 70 | ||
| Amp range (A) | 1 x 10-8 to 1 x 10-11 |
1 x 10-5 to 1 x 10-11 | |
| Detector | Faraday cup | Secondary electron multiplier/Faraday cup | Secondary electron multiplier |
| Maximum bake temperature (ºC) | 120 | ||
| Gas supply valve | Duct control valve with orifice | ||
| Maximum sampling pressure (kPa) | 13 | ||
| PC interface | RS-232C/485 | ||
| External I/O | Analog inputs (x 2), set point outputs (x 2) | ||
| Software | QMS Control System 2001 | ||
| Utilities | Power supply voltage : 100 VAC, 10 A ; Dry N2 : 0.4 to 0.7 MPa | ||
| Options | Height adjustment stand, baking heater, gas supply valve, RS-232C/485 converter, ionization vacuum gauge, Pirani vacuum gauge, forepump, host communication software (SECS/GEM), data processing software (Origin-QCS) | ||














