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ULVAC VACUUM >  Gas analyzers > Gas analyzers > REPROS Process Monitors for Reaction Gas

REPROS Process Monitors for Reaction Gas

REPROS Process Monitors for Reaction Gas

The REPROS systems are process monitors used with reactive processes such as etching and CVD. They supply and analyze process chamber gas using a mass filter gas analyzer and differential evacuation system. REPROS models have outstanding corrosion resistance, and enable stable measurements over extended periods. Their ion sources have low thermal reactivity and molecular breakdown, enabling accurate monitoring of process reactions.

Features
  • • Stable measurements in reactive processes for extended periods

    • Original high-sensitivity closed ion source prevents breakdown due to ionization, and breakdown and adsorption due to thermal reaction.

    • Compact duct control valve minimizes the distance to the process chamber, enabling quick-response analysis.

    • Measurement under wide range of pressures (10-6 to 13kPa)

    • Compact and lightweight design makes attachment to process chamber easy.
Applications
  • • Monitoring reaction gases in processes

    • End point monitoring of etching and cleaning processes

    • Residual gas measurement

    • Leak Tests
Specifications
Model RE-201P RE-202P RE-402P
Measured atomic mass number range (amu) 2 to 200 2 to 400
Resolution M/ΔM=1M(10%P.H.)
Sensitivity
Direct supply (A/Pa)
Orifice supply
 
1 x 10-7
1 x 10-6
 
1 x 10-3
1 x 10-2
Minimum detection partial pressure (Pa) 5 x 10-8 1 x 10-10
Ion source Closed ion source with magnet
Filament V-shaped Ir/Y2O3 (x 1)
Ionization voltage (eV) 20 to 70
Amp range (A) 1 x 10-8 to
1 x 10-11
1 x 10-5 to 1 x 10-11
Detector Faraday cup Secondary electron multiplier/Faraday cup Secondary electron multiplier
Maximum bake temperature (ºC) 120
Gas supply valve Duct control valve with orifice
Maximum sampling pressure (kPa) 13
PC interface RS-232C/485
External I/O Analog inputs (x 2), set point outputs (x 2)
Software QMS Control System 2001
Utilities Power supply voltage : 100 VAC, 10 A ; Dry N2 : 0.4 to 0.7 MPa
Options Height adjustment stand, baking heater, gas supply valve, RS-232C/485 converter, ionization vacuum gauge, Pirani vacuum gauge, forepump, host communication software (SECS/GEM), data processing software (Origin-QCS)
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