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ULVAC VACUUM >  Power Supplies > Eb Power Supplies > EGK/EGL/EGO Series EB gun for vacuum evaporation

EGK/EGL/EGO Series EB gun for vacuum evaporation

EGK/EGL/EGO Series EB gun for vacuum evaporation

ULVAC EB guns for electron beam evaporation all use magnetic field deflection, and are structured to minimize contamination from the evaporated material. A wide lineup of models is available. The EGK Series is designed for low-capacity research applications, the EGL Series is for metal film production, and the EGO Series is for optical film production.

Features
  • • EGK/EGL models are ideal for metal evaporation.

    • EGL models and EGO models are deflected 270‘® to eliminate filament contamination.

    • EGL models have high crucible cooling performance, and a structure that minimizes contamination.

    • EGO models have high-speed sweep and vertical incidence, ideal for use with oxide and compound evaporation.
Applications
  • • Evaporation sources for electron beam evaporation
Specifications
EB guns for metal films
Crucible capacity
3cc 10cc 20cc 40cc 110cc 180cc
Quantity of crucibles 1 EGK-3 EGL-35 EGL-110 EGL-180
3   EGL-103S
* 1
EGL-203S
* 1
4 EGK-3M EGL-35M
* 2
EGL-35M
*2
EGL-80M EGL-180M
6 EGL-206M EGL-406M

  *1 For ultra-high vacuums
  *2 Standard type has two 10 cc crucibles and two 40 cc crucibles.


EB guns for optical films
Crucible capacity
10cc 20cc 40cc 110cc
Quantity of crucibles 4 EGO-40M *1 EGO-40M *1 EGO-110M
6 EGO-206M

  *1 Standard type has two 10 cc crucibles and two 40 cc crucibles.
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